论文部分内容阅读
利用电弧离子镀方法 ,对独立的Ti靶和Zr靶的电流进行控制 ,成功地在高速钢基体上制备了不同成分配比的 (Ti,Zr)N薄膜 .透射电子显微镜结果表明 :(Ti,Zr)N薄膜为单一的fcc结构 .采用X射线衍射分析显示 :(Ti,Zr)N薄膜出现分离的 (Ti,Zr)N、(Zr ,Ti)N、TiN、ZrN的混合相结构 .(Ti,Zr)N膜层随弧电流的增加 ,择优取向从 (2 2 0 )→ (111) (2 2 0 )→ (111)变化 .显微硬度测试表明 ,薄膜具有很高的硬度 ,在较宽的成分范围内硬度基本保持一致 .同时探讨了 (Ti,Zr)N薄膜的宏观残余应力、显微硬度之间的关系及其微观机制 .
(Ti, Zr) N thin films with different compositions were successfully prepared on high speed steel substrate by controlling the current of Ti targets and Zr targets by means of arc ion plating.The results of transmission electron microscopy showed that (Ti, Zr) N thin film is a single fcc structure.Using X-ray diffraction analysis, the mixed phase structure of (Ti, Zr) N, (Zr, Ti) N, TiN and ZrN appears in the (Ti, Zr) Ti, Zr) N films with the increase of arc current, the preferred orientation changes from (2 2 0) → (111) (2 2 0) → (111) .The microhardness tests show that the film has a high hardness The results show that the hardness of the (Ti, Zr) N thin films is consistent with that of the broader composition, and the relationship between the micro-residual stress and the microhardness of the (Ti, Zr) N thin films is also discussed.