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电子线性加速器一般使用大功率速调管作为高频源。在加速器运转期间,通过大功率脉冲时,该管的氧化铝陶瓷窗往往遇到破坏。为此,作者进行了各种实验,例如用TiN膜(4.5nm)涂敷在氧化铝表面,降低氧化铝的二次电子发射系数,以防氧化铝陶瓷窗损坏。但是,实验结果并不十分理想,而且还能观察到氧化铝陶瓷窗上由于次级电子倍增而引起局部发热溶融情况。因此,作者认为,不能只停留在对TiN膜涂层的处理,而要加强对氧化铝陶瓷本身的改进。
Electronic linear accelerator generally use high-power klystron as a high-frequency source. Alumina ceramic windows of the tube often experience damage during high-power pulsing during accelerator operation. For this reason, the author conducted various experiments, for example, coating the alumina surface with a TiN film (4.5 nm), reducing the secondary electron emission coefficient of the alumina to prevent the alumina ceramic window from being damaged. However, the experimental results are not very satisfactory, but also observed on the alumina ceramic window due to the secondary electron multiplication caused by local heating melting situation. Therefore, the author thinks, can not just stay in TiN film coating treatment, but to strengthen the alumina ceramic itself improved.