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本文探讨了在常温下用电子束蒸发制备SnO_2透明导电膜的方法,指出了影响膜层主要性能的两个关键因素,并对SnO_2膜的导电机理进行了初步分析.
In this paper, the method of preparing transparent conductive film of SnO_2 by electron beam evaporation at room temperature is discussed. Two key factors that affect the main properties of the film are pointed out, and the conductive mechanism of SnO_2 film is analyzed preliminarily.