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1.氮化钛涂层技术的发展在金属基体上涂复高硬度耐磨层的工艺方法已出现多年,主要有两种:第一种叫做化学气相沉积(CVD)法,此法的工作温度通常在900℃以上,因此主要用来在硬质合金基体上沉积耐磨层;第二种方法叫做物理气相沉积(PVD)法,此法工作温度约为500℃,不损害高速钢的热硬度,因此适于在淬硬的高速钢刀具上沉积耐磨层。所谓离子镀层(Ion plating)法,系物理气相沉积法中的一种,早在1939年已首次取得一项专利。后来美国国家航空和航天局
1. The development of titanium nitride coating technology In the metal matrix coated with high hardness wear-resistant layer of the process has been there for many years, there are two main types: The first is called chemical vapor deposition (CVD) method, the method of working temperature Usually above 900 ℃, so it is mainly used to deposit the hard-wearing layer on the cemented carbide substrate. The second method is called physical vapor deposition (PVD) method. The working temperature is about 500 ℃, which will not damage the hot hardness , And is therefore suitable for depositing wear layers on hardened HSS tools. The so-called ion plating (Ion plating) method, Department of Physical Vapor Deposition, as early as 1939 has made a patent for the first time. Later, the National Aeronautics and Space Administration