低损耗硅钢薄带的织构分析

• 作 者: 姚中
• 出 处: 金属学报
• 发表日期: 1976年01期
• 关键词: 薄带 损耗比 磁畴结构 强立 磁致伸缩系数 磁畴取向 晶粒大小 总损耗 晶粒取向 平均晶粒尺寸

近年来,我们对研制的含硅3%、厚0.1毫米的低损耗硅钢薄带试样,在进行织构分析时,发现损耗最低的并不象通常所认为的一定要具有最完善的单一织构,而往往在具有菱形与立方的强混合织构的材料中出现最低的损耗值。这是一个值得提出讨论的问题。我们汇集了几种分别具有强菱形、强立方或混合织构的典型试样(见表1),加以对比研究。

In recent years, we have developed the silicon 3%, 0.1 mm thick low loss silicon steel strip samples, in the texture analysis, we found that the lowest loss is not as commonly thought to have the most perfect single weaving Structure, and often the lowest loss value occurs in materials with a strongly mixed texture of rhombus and cubic. This is a question worth discussing. We assembled several typical samples with strong diamond, strong cubic or mixed texture (see Table 1) and compared them.