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1982年,IBM公司的研究者首次报道将激励激光器用于半导体光刻。从此,激励激光器进入了用于接触曝光和掩模制造等的商品系统中。然而,最终的目标是研制激励激光器圆片步进光刻机,因为步进光刻机是任何半导体厂的骨干设备。1986年,AT＆T Bell实验室报道了激励激光器步进光刻机,打那以后,许多不同的工艺实验室和步进光刻机生产厂公开了他们关于类似计划方面的进展。若干光刻设备制造厂开始接受激励步进光刻机的定单,但是激励激光器在光刻中的前途并不见得比以往更为光明。
In 1982, IBM researchers first reported the use of exciters for semiconductor lithography. Since then, excitation lasers have entered commercial systems for contact exposure and mask fabrication. However, the ultimate goal is to develop an energized laser wafer stepper that is the backbone of any semiconductor plant. In 1986, AT & T Bell Labs reported an energized laser stepper, and after that many of the different process labs and stepper manufacturers made their progress on similar projects. Several lithography equipment manufacturers are beginning to accept orders for stimulating stepper lithography, but the future of stimulating lasers in lithography is not necessarily brighter than ever.