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  5. Deposition of transparent conductive films at atmospheric pressure

Deposition of transparent conductive films at atmospheric pressure

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：woaibaobei123321
【摘 要】
：
In the present work,we described the results of deposition of Al-doped ZnO films (AZO).AZO films were deposited by a DC Arc plasmatron at the atmospheric pressure.
【作 者】
：
O.V. Penkov K.A. Liakhov S.M. Chen I.J. Kang H.J. Lee S.Z. Yang 
【机 构】
：
Jeju National University, 1 Ara-1 690-756 Jeju , Korea
【出 处】
：
2011年第三届微电子及等离子体技术国际会议
【发表日期】
：
2011年9期
【关键词】
：
Plasmatron Deposition Zinc Oxide 
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In the present work,we described the results of deposition of Al-doped ZnO films (AZO).AZO films were deposited by a DC Arc plasmatron at the atmospheric pressure.
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