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  5. Spectral Characteristics of High Power Pulsed Magnetron Discharge Enhanced by High-voltage Pulse

Spectral Characteristics of High Power Pulsed Magnetron Discharge Enhanced by High-voltage Pulse

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：ykq1999
【摘 要】
：
Plasma based ion implantation & deposition (PBII&D) technique has been utilized for surface processing.To achieve metal or compound films,filtered pulsed cathodic arc plasma source is frequently insta
【作 者】
：
Zhongzhen Wu Xiubo Tian Sida Cheng Chunzhi Gong Shiqin Yang 
【机 构】
：
State Key Lab. of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China
【出 处】
：
2011年第三届微电子及等离子体技术国际会议
【发表日期】
：
2011年9期
【关键词】
：
High Voltage Pulse Self-excited Glow Discharge Spectral Characteristics HPPMS-PI 
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Plasma based ion implantation & deposition (PBII&D) technique has been utilized for surface processing.To achieve metal or compound films,filtered pulsed cathodic arc plasma source is frequently installed in the camber.
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