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A photoemission-assist plasma (PAP) ion source can be generated with low kinetic energy ions (E,) estimated as low as 0.1~100eV,which was striking smaller than conventional ion beam source (few keV).Additionally,we have reported previously that the surface roughness of mechanical polished Cu surfaces can be reduced by low-energy Ar+-PAP ion beam irradiation[1].However,there were significant uncertainties for the sputtering yield of PAP ion beam at energies near and below the sputtering threshold energy.