Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta_2O_5 thin film

• 作 者: 周继承 罗迪恬 李幼真 刘正
• 机 构: School of Physics Science and Technology,Central South University,
• 出 处: Transactions of Nonferrous Metals Society of China
• 发表日期: 2004年期
• 关键词: annealing sputtering magnetron hexagonal annealed amorphous roughness visible ex

Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing(RTA). Influence of sputtering pressure and annealing temperature on surface characteristics,microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta2O5 thin films are amorphous. It takes hexagonal structure(δ-Ta2O5) after being annealed at 800 ℃. A transition from δ-Ta2O5 to orthorhombic structure(L-Ta2O5) occurs at 900-1 000 ℃. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.

Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing (RTA). Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta2O5 thin films were investigated. It takes hexagonal structure (δ-Ta2O5) after being annealed at 800 ° C. A transition from δ-Ta2O5 to orthorhombic structure (L-Ta2O5) occurs at 900-1000 ° C. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.