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光化学表面加工是近年来开发的新方向,从七十年代末,八十年代初起步,经过几年来许多研究人员的潜心研究,即将登上工业舞台.在光刻工艺中,光化学微细加工的目标是实现0.25微米的光刻,为下一代VLSI提供一种简便的、快速的和耗资少的光刻工艺.它很可能是替代x-射线、电子束或离子束工艺的新一代光刻工艺技术.另外,光化学工艺还可发展成为一种激光直写工艺,这种工艺对于高精度修版,整片规模集成和电路原型设计都是十分有用的.
Photochemical surface processing is a new direction of development in recent years, starting from the late seventies, early eighties, after years of painstaking research by many researchers, is about to board the industrial arena .In the photolithography process, the goal of photochemical microfabrication Is a 0.25 micron photolithography that provides a simple, fast and cost-effective lithography process for the next generation of VLSIs, and is likely to be the next generation of lithography technology to replace x-ray, electron beam or ion beam technology In addition, the photochemical process can be developed into a laser direct writing process that is very useful for high accuracy revision, full scale integration, and circuit prototyping.