论文部分内容阅读
介绍了利用高倍放大的超薄多层膜的剖面图，经ＦＣ数字化图像处理系统进行数字化处理后，给出详细的定量结构参数的详细过程。并给出了对利用平面磁控溅射淀积的１０个周期数的Ｍｏ／Ｓｉ周期多层膜的实际处理结果，获得了界面上的渗透层厚度和粗糙度值，并与小角Ｘ光衍射法测得的结果进行了比较。
The cross section of ultrathin multilayers with high magnification is introduced. After digitized by the digital image processing system of FC, the detailed process of quantitative structure parameters is given. The practical treatment results of Mo / Si multilayered films deposited by planar magnetron sputtering for 10 cycles were also given. The thickness and roughness of the permeable layer on the interface were obtained. The results were compared with small angle X-ray diffraction The measured results were compared.