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采用等离子体型反应离子镀膜技术在经离子掺金的试件上镀制SiO2 、SiO2 TiO2 透明陶瓷膜 ,并对该膜进行电子探针成分定量分析、薄膜X射线衍射分析、透明陶瓷保护膜硬度测试和磨损实验。
Plasma-type reactive ion plating technique was used to make SiO 2 and TiO 2 transparent ceramic films on the ion-doped samples. Quantitative analysis of the electron probe composition, X-ray diffraction analysis, transparent ceramic protective film hardness test And wear test.