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用离子束辅助非平衡中频磁控溅射技术,在Si,高速钢或不锈钢基体上分别沉积得到了具有多组分过渡金属层缓冲的W梯度掺杂类金刚石碳(DLC)膜,研究了W靶电流对DLC膜组成、结构和性能的影响。实验表明,随着W靶电流增大,薄膜中W掺杂量增加,W的碳化物含量增加,sp~3结构含量减少;薄膜的纳米硬度和弹性模量逐渐增大,且材料抗塑性参数H/E随之增大;随W靶电流增大,材料与基体结合力增强,划痕实验临界载荷在80—100 N之间,材料摩擦系数增大;但磨损率因W掺杂而明显减小,且随W靶电流增大而减小。样品表面元素分布均匀,粗糙度(R_a)较小,R_a值在7.56—15.8 nm之间。
W-gradient doped diamond-like carbon (DLC) films with multi-component transition metal buffer were deposited on Si, HSS or stainless steel substrates by ion beam-assisted unbalanced IF magnetron sputtering. The effects of W Effect of target current on the composition, structure and properties of DLC films. The experimental results show that as the W target current increases, the amount of W doping in the film increases, the content of W increases and the content of sp ~ 3 decreases. The nano-hardness and elastic modulus of the film gradually increase, H / E increases. With the increase of W target current, the bond strength between the material and the matrix increases. The critical load of the scratch test is between 80 and 100 N, and the friction coefficient of the material increases. However, the wear rate is obvious due to W doping Decreases, and decreases as W target current increases. The sample surface elements are evenly distributed, the roughness (R_a) is small, R_a value between 7.56-15.8 nm.