论文部分内容阅读
随着半导体器件和集成电路向中、大规模方向的发展,制版工艺对超微粒干版提出越来越高的要求。遵照毛主席“中国人民有志气,有能力,一定要在不远的将来,赶上和超过世界先进水平”的教导,我所学习采用各兄弟单位的宝贵经验,对超微粒干版的制备工艺逐渐改进,使超微粒干版的质量基本稳定。同时对提高干版的均匀度、分辨率、感光速度、牢度等几方面做了一些点滴的摸索试验,目前使用尚较满意,可以拍摄1～2微米的线条。现将我所制备的一些情况小结如下。
With the development of semiconductor devices and integrated circuits in large and medium-scale, the plate making technology has put forward higher and higher requirements for the ultra-fine particle dry plate. Following Chairman Mao’s teachings of “Chinese people have ambition and ability, we must catch up with and surpass the advanced world level in the near future”, I learned to use the valuable experiences of various brothers and units to prepare the preparation process of the microparticles Gradually improved, so that the quality of the microparticle dry version of the basic stability. At the same time to improve the uniformity of dry plate, resolution, light speed, fastness and other aspects of some groping experiments, the current use is still more satisfactory, you can shoot 1 to 2 micron lines. Now I prepared some of the circumstances are summarized as follows.