【摘 要】
：
Nanocrystalline Ti54.5Ni45.5 thin film was prepared by magnetron sputtering followed by rapid thermal annealing.The film displayed martensite structure and (001) compound twin substructure,and the transformation temperatures Ms and As are 313 and 365 K,re
【机 构】
：
School of Materials Science and Engineering, Tianjin University of Technology, 300384 Tianjin, China
论文部分内容阅读
Nanocrystalline Ti54.5Ni45.5 thin film was prepared by magnetron sputtering followed by rapid thermal annealing.The film displayed martensite structure and (001) compound twin substructure,and the transformation temperatures Ms and As are 313 and 365 K,respectively.The reflectivity for the wavelength from 200 to 800 nm at 298 and 393 K was investigated,and the results showed that the optical reflectivity contrast between martensite and austensite at 780,650,514 and 405 nm was 105.64,170.83,112.22 and 149.92％,respectively,which were larger than those of other reported optical recording materials.
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