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本文研究X射线Bragg－Fresnel元件中多层膜结构的热学及化学稳定性。介绍了实验方案及工艺条件。实验结果表明该多层膜结构在后续工艺中的热及化学载荷下性能是稳定的．并且在高温（300℃以下）的热稳定性也是好的。
This paper studies the thermal and chemical stability of multilayer films in X-ray Bragg-Fresnel devices. The experimental scheme and process conditions are introduced. The experimental results show that the multi-layer structure is stable under the thermal and chemical loading in the subsequent process. And the thermal stability at high temperatures (below 300 ° C) is also good.