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本文中简单叙述了KYF-450型离子镀设备。用HCD工艺完成了反应离子镀氮化钛。膜层的硬度在2000kg/mm~2以上,沉积速率是0.08μ-0.23μ/分。沉积速率是坩埚与基体间距和基体负电位的函数。膜层的硬度是基体负电位和氮气分压的函数。氮化钛膜的颜色随氮气分压的变化而改变。测定了氮化钛膜的光谱反射率。
This article briefly describes the KYF-450 ion plating equipment. Reactive ion plating titanium nitride was completed by HCD process. The hardness of the film is over 2000kg / mm ~ 2 and the deposition rate is 0.08μ-0.23μ / min. The deposition rate is a function of the distance between the crucible and the substrate and the negative potential of the substrate. The hardness of the film is a function of the substrate negative potential and the partial pressure of nitrogen. The color of titanium nitride film changes with the partial pressure of nitrogen. The spectral reflectance of the titanium nitride film was measured.