【摘 要】
:
A new EIPIG (Electron Injected-Penning Ionization Gauge) ion source is now under developing in IMP. This source aims to produce high intensity metallic ions of
【出 处】
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IMP & HIRFL Annual Report
论文部分内容阅读
A new EIPIG (Electron Injected-Penning Ionization Gauge) ion source is now under developing in IMP. This source aims to produce high intensity metallic ions of 2-3 charge state. To satisfy this requirement, we introduced some innovations based on typical hot cathode penning source in the design of EIPIG, such as injecting electron into the plasma, which increases the density of electrons in the plasma and enhances PIG
A new EIPIG (Electron Injected-Penning Ionization Gauge) ion source is now under developing in IMP. This source aims to produce high intensity metallic ions of 2-3 charge state. We provide some innovations based on typical hot cathode penning source in the design of EIPIG, such as injecting electron into the plasma, which increases the density of electrons in the plasma and enhances PIG
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