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本文介绍了 C_yF_(14)+ O_2等离子刻蚀 a=Si:H/a-C:H 超晶格的工艺原理及方法,简便可行.
This paper introduces the principle and method of C_yF_ (14) + O_2 plasma etching a = Si: H / a-C: H superlattice, which is simple and feasible.