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【摘 要】
：
Nanocrystalline tungsten carbide thin films were fabricated on graphite substrates by plasma enhanced chemical vapor deposition (PECVD) at H2 and Ar atmosphere,
【机 构】
：
Department of Applied Chemistry
【出 处】
：
材料科学技术学报（英文版）
【发表日期】
：
2004年期
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