【摘 要】
：
以ZrCl4-BCl3-H2-Ar为反应体系,低压下在石墨基体表面制备得到ZrB2涂层。采用X射线衍射和扫描电镜研究沉积温度和沉积位置对ZrB2涂层物相成分和微观形貌的影响。结果 表
【机 构】
：
中南大学粉末冶金国家重点实验室 湖南长沙410083
【出 处】
：
第二届中国国际复合材料科技大会 (CCCM-2)
论文部分内容阅读
以ZrCl4-BCl3-H2-Ar为反应体系,低压下在石墨基体表面制备得到ZrB2涂层。采用X射线衍射和扫描电镜研究沉积温度和沉积位置对ZrB2涂层物相成分和微观形貌的影响。结果 表明：在1500～1600℃时,沉积涂层物相主要为的ZrB2,混有少量的ZrC,ZrB2晶粒择优取向随沉积温度的升高而发生变化。在1500℃时,ZrB2晶粒择优取向不明显,(001) (100) (101) (002)峰值较高；1550℃时,晶粒取向(001) (002)面下降明显,且出现少量不明显的ZrC峰；随着沉积温度的进一步升高至1600℃,晶粒择优取向面为(100) (101) (002) (200),涂层中ZrC峰形更加明显。
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