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探讨了匀胶速度、热分解温度及退火温度对CSBT/LNO薄膜取向和性能的影响。结果表明:制备(200)衍射峰择优的CSBT/LNO薄膜的最佳热处理工艺条件为:匀胶速度4000r/min,热分解温度400℃,退火温度为725℃;薄膜样品呈现a轴择优取向,I(200)/I(119)=1.26;样品铁电性能优良,剩余极化强度2Pr=36.7μC/cm2,对应的矫顽电场2Ec=156kV/cm;相对介电常数εr=215,具有较好的频率稳定性。
The effects of speed, thermal decomposition temperature and annealing temperature on the orientation and properties of CSBT / LNO films were investigated. The results show that the best heat treatment conditions for CSBT / LNO films with (200) diffraction peak are as following: the speed of spin-coating is 4000r / min, the thermal decomposition temperature is 400 ℃ and the annealing temperature is 725 ℃; I (200) / I (119) = 1.26. The ferroelectric properties of the samples are excellent, the remanent polarization 2Pr = 36.7μC / cm2, the corresponding coercive field 2Ec = 156kV / cm and the relative dielectric constant εr = 215. Good frequency stability.