The fabrication of MgB2 nano-bridges by electron-beam annealing and FIB etching

来源 :第八届亚洲应用超导会议 | 被引量 : 0次 | 上传用户：xxk2010

【摘要】

：

　　100nm thin Mg/B precursor films were prepared on SiC substrates in ZZSX-500 vacuum coating machine and annealed by electron-beam which only took fractions o

【作者】

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LiY.L.[1]XuZ.[2]KongX.D.[3]HanL.[3]LiX.N.[3]

【机构】

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Department of Micro-nano Fabrication Technology,Institute of Electrical Engineering,CAS,Beijing,1001

【出处】

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第八届亚洲应用超导会议

【发表日期】

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2015年期

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　　100nm thin Mg/B precursor films were prepared on SiC substrates in ZZSX-500 vacuum coating machine and annealed by electron-beam which only took fractions of a second.In this paper the best condition of electron-beam annealing to fabricate the superconducting MgB2 thin films was studied.Under the optimized annealing process(accelerating voltage 15kV,electron beam current 5mA,annealing duration 0.7s),the superconducting MgB2 thin films with critical temperature Tcon = 35.3 K and transition width ΔTc 1 K was fabricated.Nano-bridges(50nm wide) were prepared on the superconducting MgB2 thin films by FIB.

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The fabrication of MgB2 nano-bridges by electron-beam annealing and FIB etching

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