Characterization of Cr and Ti based boron nitride thin films

• 作 者: Jyh-WeiLee[1]Chih-HongCheng[2]Li-WeiHo[3]Jenq-GongDuh[4]
• 机 构: Department of Materials Engineering, Ming Chi University of Technology, Taipei, Taiwan
• 出 处: 第七届海峡两岸薄膜科学与技术研讨会
• 发表日期: 2011年期

The Cr and Ti based boron nitride thin films,including Cr–B–N and Ti-Cr–B–N coatings with various boron contents were deposited by a co-sputtering process using a pulsed DC reactive magnetron sputtering system.The structures and BN bonding nature of thin films were characterized by X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FTIR),respectively.