【摘 要】
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The thesis introduces the principle and course of a-Si:H films deposited with PECVD technique, the determination of characteristics of photoconductivity, and th
【机 构】
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华东师范大学电子科学技术系,华东师范大学电子科学技术系,华东师范大学电子科学技术系,华东师范大学电子科学技术系
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The thesis introduces the principle and course of a-Si:H films deposited with PECVD technique, the determination of characteristics of photoconductivity, and the variation under different substrate temperatures. (100-300℃). Through the experiment the activation energy is obtained, and the result shows that the best substrate-temperature is 250℃. Further analysis and discussions from distributions of hydrogen are also made.
The thesis introduces the principle and course of a-Si: H film deposited with PECVD technique, the determination of characteristics of photoconductivity, and the variation under different substrate temperatures. (100-300 ° C.) Through the experiment the activation energy is obtained, and the result shows that the best substrate-temperature is 250 ° C. Further analysis and discussions from distributions of hydrogen are also made.
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