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本文给出低能离子法向轰击二元化合物时,总原子溅射率Y和刻蚀速率R_o陆离子能量E变化的经验公式. 计算结果表明:若低能氩离子法向轰击二元化合物,则由经验公式算出的总原子溅射率和刻蚀速率与实验值的最大相对误差小于20％。
In this paper, empirical formulas of total atom sputtering rate Y and etching rate R_o ion E are obtained by bombardment of binary compounds with a low energy ion. The calculation results show that if the bombardment of binary compounds by low energy argon ions is performed by The maximum relative error between the total atomic sputtering rate and the etching rate and the experimental value calculated by empirical formula is less than 20%.