Deep-UV fluorescence lifetime imaging microscopy

• 作 者: Christiaan J.de Jong Alireza Lajevardipour Mindaugas Gecevi?ius Martynas Beresna Gediminas Gervinskas Peter G.Kazansky Yves Bellouard Andrew H.A.Clayton Saulius Juodkazis
• 机 构: Centre for Micro-Photonics, Faculty of Science, Engineering and Technology, Swinburne University of
• 出 处: Photonics Research
• 发表日期: 2015年05期
• 关键词: lifetime silica annealing structuring fused defects characterize illumination re

A novel fluorescence lifetime imaging microscopy(FLIM) working with deep UV 240–280 nm wavelength excitations has been developed. UV-FLIM is used for measurement of defect-related fluorescence and its changes upon annealing from femtosecond laser-induced modifications in fused silica. This FLIM technique can be used with microfluidic and biosamples to characterize temporal characteristics of fluorescence upon UV excitation, a capability easily added to a standard microscope-based FLIM. UV-FLIM was tested to show annealing of the defects induced by silica structuring with ultrashort laser pulses. Frequency-domain fluorescence measurements were converted into the time domain to extract long fluorescence lifetimes from defects in silica.

A novel fluorescence lifetime imaging microscopy (FLIM) working with deep UV 240-280 nm wavelength excitations has been developed. UV-FLIM is used for measurement of defect-related fluorescence and its changes upon annealing from femtosecond laser-induced modifications in fused silica. This FLIM technique can be used with microfluidic and biosamples to characterize temporal characteristics of fluorescence upon UV excitation, a capability easily added to a standard microscope-based FLIM. UV-FLIM was tested to show annealing of the defects induced by silica structuring with ultrashort laser pulses. Frequency-domain fluorescence measurements were converted into the time domain to extract long fluorescence lifetimes from defects in silica.