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从理论和实验上研究了材料功函数对场致发射稳定性的影响。研究发现，功函数是决定材料发射稳定性的主要因素。所得数据表明：（1）尖端功函数越稳定，发射电流波动性就越小；（2）尖端的功函数越小，发射的电流也越稳定，强度也越大，所需要的门极电压越低。这一结论在实验研究中充分地得到证实。实验表明，不需要超高真空条件，经过金膜或铯膜覆盖的钽尖端都有稳定的场发射。
The effect of material work function on the field emission stability has been studied theoretically and experimentally. The study found that work function is the main factor that determines the stability of material launch. The data obtained show that: (1) the more stable the tip work function, the less the fluctuation of the emission current; (2) The smaller the work function of the tip, the more stable the emitted current and the greater the intensity of the required gate voltage low. This conclusion is fully confirmed in the experimental study. Experiments show that, without the need for ultra-high vacuum conditions, the tantalum tip coated with gold or cesium film has a stable field emission.