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研究纳米器件和超大规模集成电路制造中污染物的来源及其特点.列出简单方便、实用有效的清除污染物的方法和步骤,通过该方法,可以清除基底表面大于300 nm的有机和无机污染物.给出简单地检测和评估基底表面污染物含量和大小的方法,并设计一种实验室在线测量空气中悬浮粒子浓度的简单设备,提出制备超纯净水的工艺流程.
To study the sources and characteristics of pollutants in the fabrication of nanodevices and very large scale integrated circuits, and to provide a simple and practical method of removing pollutants and steps that can be used to remove organic and inorganic contaminants greater than 300 nm at the substrate surface The method of simply detecting and evaluating the content and size of the pollutants on the surface of the substrate is given and a simple device for measuring the concentration of suspended particles in the air on the laboratory is designed. The technological process of preparing ultrapure water is proposed.