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为了高效加工优质的超光滑表面,提出了一种超光滑表面加工的新方法:纳米颗粒胶体动压空化射流抛光(HCJP).此法利用纳米颗粒与工件表面之间的界面化学反应实现工件表面的原子级去除,并且利用空化射流中的水力空化现象强化加工过程中的机械与化学作用以提高加工效率.设计了HCJP原型装置,并在此基础上对HCJP技术进行了初步实验.结果表明,较低的系统压力有利于得到优质的表面,使用该方法能在K9玻璃上得到粗糙度值在1 nm左右的超光滑表面,证明此技术可以广泛应用于超光滑表面的加工.
In order to process high-quality ultra-smooth surface efficiently, a new method of ultra-smooth surface processing is proposed: nanoparticle colloid dynamic pressure cavitation jet polishing (HCJP) .This method uses the interfacial chemical reaction between nanoparticles and the workpiece surface to realize the workpiece Surface atomic level removal, and the use of cavitation jet cavitation in the process of strengthening the role of mechanical and chemical processes to enhance processing efficiency.Designed HCJP prototype device, and based on the HCJP technology preliminary experiments. The results show that the lower system pressure favors the production of a superficial surface. Using this method, an ultra-smooth surface with a roughness of about 1 nm can be obtained on K9 glass, which proves that this technique can be applied to the processing of ultra-smooth surfaces.