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在用光学曝光获得亚微米刻蚀方面,反差增强技术是简单有效的方法之一。近年来日益受到重视。在正性抗蚀剂膜层上施用水可溶性光褪色材料,更有其独特的优点:可用亲水聚合物作反差增强层(CEL:Contrast Enhancement Layer)载体物质,涂敷时不会和疏水的正性抗蚀剂膜发生混层现象;当正性抗蚀剂在碱性水溶液中显影时,反差增强层即可同时除掉。因而,涂敷和加工都很方便。日本松下电气半导体研究中心的远藤政孝等人对此进行了系统的研究。现作一简要介绍。一、反差增强材料(CEM:Contrast Enhancement Materials) 所采用的水溶性CEM称为WSP(Water-Soluble Photopolymer),主要由三种组份构成:
Contrast enhancement technology is one of the simple and effective ways to achieve submicron etching with optical exposure. In recent years, more and more attention. The application of a water-soluble photochromic material to a positive resist film has the unique advantages of being able to use a hydrophilic polymer as a contrast-enhancing layer (CEL: Contrast Enhancement Layer) carrier material that does not bind to hydrophobic Positive resist film mixed layer phenomenon; when the positive resist in alkaline aqueous solution, the contrast enhancement layer can be removed at the same time. Therefore, the coating and processing are very convenient. Japan Matsushita Electric Semiconductor Research Center, Endo Zheng Xiao and others conducted a systematic study of this. Now make a brief introduction. First, the CEM (Contrast Enhancement Materials) used water-soluble CEM called WSP (Water-Soluble Photopolymer), mainly composed of three components: