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The fabrication of an internal diffraction grating with photoinduced refractive index modification in planar hybrid germanium-silica plates was demonstrated using low-density plasma formation excited by a high-intensity femtosecond (150 fs) Ti:sapphire laser (λp=790 nm).The refractive index modifications with diameters ranging from 400 nm to 3 μm were photoinduced after plasma formation occurred upon irradiation with peak intensities of more than 2×1013 W/cm2.The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred.
The fabrication of an internal diffraction grating with photoinduced refractive index modification in planar hybrid germanium-silica plates was demonstrated using low-density plasma formation excited by a high-intensity femtosecond (150 fs) Ti: sapphire laser (λp = 790 nm). refractive index modifications with diameter ranging from 400 nm to 3 μm were photoinduced after plasma formation occurred with irradiation with peak intensities of more than 2 × 1013 W / cm 2. The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred.