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在氧气环境中电子束蒸发氧化镁制备出高结晶度的氧化镁薄膜。利用X射线衍射、扫描电镜、分光光度计及轮廓仪等测试手段分析了薄膜的性能。结果发现 :通氧气制备的MgO薄膜的结晶度比不通氧气时要高得多。基底温度、通氧气量和退火处理对结晶度的影响较大。选择适当的基底温度和通氧气量 ,可获得高结晶度的MgO薄膜 ;通氧气制备的MgO膜呈柱状结构 ,随着基底温度升高 ,薄膜的晶粒尺寸增大 ,晶界减少 ,最大晶粒尺寸达 12 0nm以上。薄膜的平均透射比在 0 9以上 ,折射率在 1 5 5～ 1 70之间。增加通氧气量或降低基底温度 ,折射率减小。
MgO thin films were prepared by electron beam evaporation of magnesium oxide in oxygen atmosphere. The properties of the films were analyzed by X-ray diffraction, scanning electron microscopy, spectrophotometer and profile analyzer. The results show that the crystallinity of MgO film prepared by oxygen is much higher than that of oxygen. Substrate temperature, the amount of oxygen and annealing on the crystallinity of a greater impact. The MgO film with high crystallinity can be obtained by choosing the appropriate substrate temperature and the oxygen flow rate. The MgO film prepared by oxygen gas has a columnar structure. With the increase of the substrate temperature, the grain size of the film increases, the grain boundary decreases, the maximum crystal Particle size up to 12 0nm above. The average transmittance of the film is above 0 9 and the refractive index is between 15 5 and 1 70. Increase the amount of oxygen or reduce the substrate temperature, the refractive index decreases.