论文部分内容阅读
IntroductionThe process development of copper/low-K backends is unique in the semiconductor industry. Thereare a substantial number of alternative integrationapproaches to the dual damascene copper processthat incorporates a low-K dielectric. With the m
Introduction The process development of copper / low-K backends is unique in the semiconductor industry. Thereare a substantial number of alternative integrationapproaches to the dual damascene copper processthat incorporates a low-K dielectric. With the m