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针对用常规光刻热熔法制作折射型微透镜阵列的过程中 ,临界角效应严重制约了长焦距微透镜阵列制作问题 ,提出了曲率补偿法 :在经过常规光刻热熔成形和离子束刻蚀技术制成的硅微透镜阵列上再涂敷几层光刻胶 ,以降低各单元微透镜的曲率 ,然后再次进行加热固化和离子束刻蚀 .扫描电子显微镜 (SEM )显示微透镜阵列为表面极为平缓的方底拱面阵列 ,表面探针测试结果显示用补偿刻蚀法制作的微透镜的物方F数和像方F′数分别可达到 49.2 6和 5 3 .5 2 ,并且微透镜的点扩散函数比较接近理想值
Aiming at the problem that the critical angle effect severely restricts the fabrication of long focal length microlens arrays in the fabrication of refraction type microlens arrays by the conventional lithography hot-melt method, a curvature compensation method is proposed. After the conventional lithography hot melt forming and ion beam engraving Etching technology to make a micro-lens array of silicon and then coated with several layers of photoresist to reduce the curvature of each unit micro-lens, and then re-heat curing and ion beam etching Scanning electron microscopy (SEM) shows that the micro-lens array is The test results of the surface probe showed that the object-side F numbers and the image-side F 'numbers of the micro lenses fabricated by offset lithography can reach 49.2 6 and 53.52 respectively, and the micro The point spread function of the lens is close to the ideal value