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用射频溅射技术制备了ZrO2 薄膜,用慢正电子束分析该薄膜,发现它的表层存在一高正电子吸收区,它与钇的表面富集有关,提出了相应的模型。
The ZrO2 thin film was prepared by radio frequency sputtering. The film was analyzed by slow positron beam. It was found that there was a high positron absorption region on the surface of the film. It was related to the surface enrichment of yttrium, and the corresponding model was proposed.