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分析和描述了一些自动检查掩模的方法,它可以检查可见的缺陷(点、针孔等)或尺寸偏差。每种方法地分析包括了其所依据的物理原理的验证,以及其所允许的偏差数值。它们所能测量出的最小缺陷尺寸是2um。这些用于可见缺陷检查的分析手段是光学像叠,双光束飞点扫描、电视显微镜以及空间滤波方法。为了检查尺寸,介绍了线条边缘位置的分析和显微密度计的测试标准。同时叙述了,具有有意引人的并且人为可控制的缺陷的掩模制作和对这些掩模的自动检查的初步结果。可以断言,一方面自动检查系统将广泛用于可见缺陷或尺寸一致性的检查以及掩模上尺寸公差的检查,另一方面;形图形中的这些特性尺寸以及芯图形间的尺寸偏差它们都必大大小于最小可探测缺陷的尺寸。
Some methods of automatically inspecting the mask are analyzed and described, and it is possible to check for visible defects (points, pinholes, etc.) or dimensional deviations. Each methodology analyzes the validation of the physical principles on which it is based and the allowable deviation values. The smallest defect size they can measure is 2um. These analytical tools for visual inspection of defects are optical image stacks, dual beam fly-spot scanning, television microscopes, and spatial filtering methods. In order to check the size, we introduced the analysis of the edge position of the line and the test standard of the micrometer. At the same time, preliminary results of masking with intentionally intrusive and artificially controllable defects and the automatic examination of these masks are described. It can be asserted that, on the one hand, the automatic inspection system will be used extensively for inspection of visual defects or dimensional consistency and for dimensional tolerances on masks; on the other hand, these characteristic dimensions in the pattern and the dimensional variations between the core patterns Largely smaller than the smallest detectable defect size.