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采用俄罗斯UVN0.5D2I离子束辅助电弧离子镀沉积设备,在高速钢W18Cr4V基材上沉积TiAlN膜层;利用N离子束对膜层沉积之前的预处理和膜层沉积时的辅助轰击,并用SEM、X射线衍射和力学测试等手段研究了N离子束轰击对膜层表面形貌、相结构、显微硬度影响.结果表明:N离子束的预处理在基材表面形成了一定厚度N的过渡层;N离子束对膜层的辅助轰击,明显地降低了膜层表面“大颗粒”的密度,改善了膜层的表面形貌;同时,形成了由过渡层成分与膜层成分动态混合的扩散层;无N离子轰击时,TiAlN膜层是由(TiAl)N相和Ti2AlN相组成;轰击能量为7.5 keV时,TiAlN膜层也是由(TiAl)N相和Ti2AlN相组成,但(TiAl)N(111)取向减弱,而(200)和(220)取向均增强;Ti2AlN(211)及(301)取向均减弱.N离子束辅助轰击,使膜层的显微硬度由原来的21 GPa提高到25.3 GPa.
Russia UVN0.5D2I ion beam assisted arc ion plating deposition equipment, high-speed steel W18Cr4V substrate deposited TiAlN film; the use of N ion beam pretreatment of film deposition and film deposition auxiliary bombardment, and SEM, X ray diffraction and mechanical tests were used to study the effect of N ion beam bombardment on the surface morphology, phase structure and microhardness of the film.The results show that the N ion beam pretreatment formed a transition layer with a certain thickness N on the surface of the substrate ; N ion beam on the film assisted bombardment, significantly reducing the film surface “large particles ” density and improve the surface morphology of the film; the same time, formed by the transition layer composition and the film composition of dynamic mixing TiAlN layer is composed of (TiAl) N phase and Ti2AlN phase. When the bombardment energy is 7.5 keV, the TiAlN layer is composed of (TiAl) N phase and Ti2AlN phase. However, (111) and (200) and (220) orientations are both enhanced; the orientations of Ti2AlN (211) and (301) are weakened.N-ion beam assisted bombardment makes the microhardness of the film layer from 21 GPa Increase to 25.3 GPa.