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利用同步辐射Ｘ射线对Ｃｒ／ＳｉＯ２系统进行了反射率测量，得到了信噪比非常好的反射率曲线。通过对实验数据进行傅立叶变换和最小二乘法拟合得到了Ｃｒ膜的厚度以及Ｃｒ膜与ＳｉＯ２衬底界面的粗糙度。结果表明，该方法对精确测定界面的粗糙度非常有效。
The reflectance of Cr / SiO2 system was measured by synchrotron radiation X-ray, and the reflectivity curve with very good signal-to-noise ratio was obtained. The thickness of the Cr film and the roughness of the interface between the Cr film and the SiO2 substrate were obtained by fitting the experimental data with the Fourier transform and the least square method. The results show that this method is very effective in accurately measuring the roughness of the interface.