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采用半胱胺锌(C2H7NS)3·Zn SO4·Zn Cl2修饰玻碳电极,以差分脉冲伏安法(DPV)在0.1 mol/L的KCl溶液中对游离Cu2+进行了测定。游离Cu2+浓度与氧化峰电流值在0.01~0.5 mmol/L范围内呈良好线性关系,线性回归方程为I=-0.1005c-1.6×10-5,相关系数为R2=98.63,检出限(S/N=3)为0.1μmol/L。通过加标实验验证修饰电极对Cu2+含量测定,回收率为95.1%~102.6%,RSD(n=5)在3%以内。考察了干扰金属离子(M g2+,Mn2+,Zn2+)对电极检测Cu2+无影响,制备的修饰电极对赖氨酸铜螯合物不响应,直接测定赖氨酸铜螯合物螯合率为91.78%和91.93%。
The free carbon (Cu2 +) was modified with cysteamine zinc (C2H7NS) 3 · Zn SO4 · Zn Cl2 on the glassy carbon electrode by differential pulse voltammetry (DPV) in 0.1 mol / L KCl solution. The linear relationship between free Cu2 + concentration and oxidation peak current was in the range of 0.01-0.5 mmol / L. The linear regression equation was I = -0.1005c-1.6 × 10-5, the correlation coefficient was R2 = 98.63. The detection limit (S / N = 3) was 0.1 μmol / L. The Cu2 + content of the modified electrode was tested by spiking experiments. The recovery rates were 95.1% ~ 102.6%, RSD (n = 5) was within 3%. The effects of interference metal ions (M g2 +, Mn2 +, Zn2 +) on the detection of Cu2 + were investigated. The prepared modified electrode did not respond to the lysine copper chelate. The direct chelation rate of copper chelate was 91.78% And 91.93%.