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制备了多种不同PMPS/BzMA质量比合成的PMPS-PBzMA共聚物,研究了旋涂成膜的膜厚控制方法和最佳热处理温度。近红外谱证实该材料在1310nm和1550nm两个窗口吸收小。实验表明,PMPS-PBzMA的光漂白效应主要来自于Si-Si的光氧化并伴有轻微的折射率各向异性,饱和过程则来自于Si-苯基的光分解且有助于缓解各向异性。归纳了初始折射率和饱和折射率与PMPS/BzMA质量比的关系,发现PMPS/BzMA质量比W(PMPS):W(BzMA)=10%制成材料的初始折射率与质量比W(PMPS):W(BzMA)=100%材料饱和折射率十分接近。据这些特性,利用质量比W(PMPS):W(BzMA)=10%材料的初始折射率和质量比W(PMPS):W(BzMA)=100%材料的饱和折射率,结合光漂白技术,成功试制了折射率对称分布的掩埋型多模PMPS-PBzMA条形波导,1310nm的传输损耗达到了0.91dB/cm。
A series of PMPS-PBzMA copolymers synthesized by different mass ratios of PMPS / BzMA were prepared. The film thickness control method and optimum heat treatment temperature for spin-coating were studied. Near-infrared spectroscopy confirmed that the material absorbs less at both the 1310 nm and 1550 nm windows. Experiments show that the photobleaching effect of PMPS-PBzMA mainly comes from the photooxidation of Si-Si with a slight anisotropy of refractive index, and the saturation process comes from the photolysis of Si-phenyl and helps to alleviate the anisotropy . The relationship between the initial refractive index and saturation refractive index and mass ratio of PMPS / BzMA is deduced. It is found that the initial refractive index to mass ratio W (PMPS) of PMPS / BzMA mass ratio W (PMPS) : W (BzMA) = 100% The saturation index of the material is very close. According to these characteristics, the initial refractive index and mass ratio W (PMPS) of the material is calculated using the mass ratio W (PMPS): W (BzMA) = 10%: W (BzMA) = 100% saturation refractive index of the material, The successful fabrication of a buried multimode PMPS-PBzMA strip waveguide with symmetric refractive index distribution resulted in a transmission loss of 0.91 dB / cm at 1310 nm.