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灰度掩模技术是制作三维微纳结构的有效方法之一,灰度掩模图设计是灰度掩模技术的重要组成部分.目前,在微机械器件制作领域中,通常只给出常用规则形状三维结构对应的灰度掩模图的设计方法,对于任意形状图形的灰度掩模图设计鲜有报道.本文综合灰度光刻技术中的编码原理和有限元法中的铺路法,提出了适合于任意形状图形的灰度掩模图设计算法,解决了误差处理和图形闭合两个关键问题,给出了算法及图形的评价方法,并利用AutoCAD二次开发工具ObjectARX研究了算法的程序实现,构建了灰度掩模图的设计系统.利用该系统设计了多幅常规规则形状和任意形状灰度掩模图,结果表明,该系统可以高效地设计任意形状图形的灰度掩模.研究工作为任意形状图形灰度掩模图的设计提供了一种新方法,可以提高灰度掩模图的设计效率,为三维微纳器件的制作提供技术积累.
Grayscale mask technology is one of the most effective methods to fabricate three-dimensional micro-nano structure, and grayscale mask design is an important part of grayscale mask technology.At present, in the field of micromachine device fabrication, only commonly used rules The design method of grayscale mask map corresponding to three-dimensional shape has rarely been reported for the grayscale mask map of arbitrary shape graphics.In this paper, the encoding principle in grayscale lithography and paving method in finite element method The algorithm of grayscale mask map design which is suitable for arbitrary shape graphics is solved, the key problems of error handling and graphics closure are solved, the algorithm and the method of graph evaluation are given, and the program of the algorithm is researched by using AutoCAD secondary development tool ObjectARX The design system of the gray mask is constructed and a number of regular mask shapes with arbitrary shape are designed by this system. The results show that the system can design the gray mask with arbitrary shape and shape efficiently. The research work provides a new method for the design of grayscale mask images of arbitrary shape, which can improve the design efficiency of grayscale mask and provide the technical product for the fabrication of three-dimensional micro / nano devices .