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采用聚合物凝胶法和封闭NH3气氛热处理(防止VO_2被氧化成V2O5)在石英玻璃衬底上制备了VO_2热致变色薄膜。XRD分析、拉曼分析、FESEM形貌和光学性能结果表明:退火温度对VO_2薄膜的微观结构起关键影响作用。随着温度从450°C升高到550°C,薄膜中晶粒生长,晶粒尺寸增加,晶界增多。温度过高时(550°C),晶粒尺寸较大且不连续,导致热调节性能下降。该实验的最优退火温度为500°C(?T_(sol)=10.4%,T_(lum)约29.0%)。
VO_2 thermochromic thin films were prepared on quartz glass substrates by polymer gel method and heat treatment in closed NH3 atmosphere (to prevent the oxidation of VO_2 to V2O5). The results of XRD, Raman analysis, FESEM and optical properties show that the annealing temperature plays a key role in the microstructure of VO_2 thin films. As the temperature increases from 450 ° C to 550 ° C, the grain growth in the film increases the grain size and increases the grain boundaries. When the temperature is too high (550 ° C), the grain size is large and discontinuous, resulting in a decrease in thermal regulation performance. The optimum annealing temperature of this experiment is 500 ° C (T T sol = 10.4%, T 约 lum about 29.0%).