论文部分内容阅读
本文对 Pd/W/Si(111)多层膜系统在稳定退火条件下形成硅化物作了研究.实验结果表明,富Pd组分的多层膜对WSi_x的晶化有明显的诱导作用.多层膜中单层膜厚的增加减弱了诱导晶化作用.利用多层膜可模拟共淀积多元膜,实现硅化物的浅接触.
In this paper, the formation of silicide under stable annealing conditions has been studied for the Pd / W / Si (111) multilayer system. The experimental results show that the multi-layer films with Pd-rich components have obvious inducing effects on the crystallization of WSi_x The increase of monolayer thickness in the film weakens the induction crystallization, and the multilayers can be used to simulate the co-deposition of the multi-layer film to achieve the shallow contact of the silicide.