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提出了一种利用热应力改变镜面曲率的可调焦微光学自适应微镜。与传统自适应微镜相比,采用该原理制作的微镜具有驱动电压低和驱动力较大的优点,而且制作简单。以硅为基底进行了表面热氧化、光刻显影、HF酸刻蚀、KOH湿法刻蚀,溅射铝膜等微加工工艺的研究,获得硅铝双金属可调焦微反射镜4×4阵列,单元尺寸3 mm×3 mm,单晶硅基底厚60μm,硅表面溅射的铝膜厚150 nm。该微镜的镜面填充率为100%,可变形镜面占总镜面面积的79%。利用激光波面干涉仪对可调焦微反射镜的动态性能进行了测试。实验表明,该微镜可产生单向连续变形,最大变形量15.8μm,非线性滞后27%,工作电压0~2.5V,可调焦范围∞~0.036 m。
A focusable micro-optical adaptive micromirror that uses thermal stress to change the curvature of the mirror is proposed. Compared with traditional adaptive micromirrors, the micromirrors fabricated by this principle have the advantages of low driving voltage and large driving force, and are easy to manufacture. Silicon-based surface thermal oxidation, photolithography and development, HF acid etching, KOH wet etching, sputtering aluminum film and other micro-processing technology to obtain silicon aluminum bimetallic focus micro-mirror 4 × 4 The array has a cell size of 3 mm × 3 mm, a single crystal silicon substrate thickness of 60 μm, and an aluminum film sputtered on the silicon surface of 150 nm. The micromirror has a mirror fill factor of 100% and the deformable mirror element accounts for 79% of the total mirror area. The dynamic performance of the focusable micromirrors was tested by laser wavefront interferometer. Experiments show that the micromirror can produce unidirectional continuous deformation with the maximum deformation of 15.8μm, nonlinear hysteresis of 27%, operating voltage of 0 ~ 2.5V and adjustable focus range of ∞ ~ 0.036 m.