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在透射电镜显微分析中,制样工作是十分重要的。随着透射电镜的日趋发展和广泛应用,制样技术也不断发展。目前,主要有两种制样方法:电化学减薄(又称双喷电解减薄)和离子减薄(又称双离子减薄)。前者,速度高,但不易把握减薄的程度,因而样品报废率较高,且只适用易于化学腐蚀的金属类材质。后者,是克服前者的缺点而出现的一种新的制样方法。本文仅就离子束减薄的原理和技术加以介绍,以期为电镜工作者提供一种有效的制样方法。
In TEM microscopy, sample preparation is very important. With the development of transmission electron microscopy and the widespread use of sample preparation technology is also growing. Currently, there are two main sample preparation methods: electrochemical thinning (also known as double jet electrolytic thinning) and ion thinning (also known as double ion thinning). The former, high speed, but not easy to grasp the degree of thinning, resulting in higher scrap samples, and only for easy chemical corrosion of metal materials. The latter is to overcome the shortcomings of the former appeared a new sample preparation method. This article only introduces the principle and technology of ion beam thinning, in order to provide an effective sample preparation method for the electron microscope workers.