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从微观粒子的相互作用和输运出发，探讨靶溅射过程中的基元化学物理步骤，计算了溅射速率和离子能量分布，为深入研究溅射薄膜的生长速率和靶中毒奠定基础。
Based on the interaction and transport of microscopic particles, the elementary chemical and physical steps in the target sputtering process are discussed. The sputtering rate and ion energy distribution are calculated, which lays the foundation for further study on the growth rate and target poisoning of sputtered films.