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美国威斯康星大学的科学家们已经开发出了一种用100纳米掩模刻制20纳米工艺芯片的技术,这将使摩尔定律出现一个意想不到的飞跃,同时有可能延长当前所使用的光刻技术的寿命。这种所谓的“亮度高峰(bright—peak)技术”可以通过调整掩模和晶片之间的空间来
Scientists at the University of Wisconsin have developed a technology that uses a 100-nanometer mask to etch a 20-nanometer process chip that will make Moore’s Law an unexpected leap forward with the potential to extend the current lithography life. This so-called “bright-peak technique” can be achieved by adjusting the space between the mask and the wafer