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用高分辨电子显微学方法研究了Ｎｉ８０Ｆｅ２０／Ｍｏ磁性多层膜，结果表明：（１）多层膜的结晶状态，随Ｍｏ非磁性层厚度而变化．当Ｍｏ层厚度为０７ｎｍ时，多层膜基本为非晶；当Ｍｏ层厚度大于１６ｎｍ时，Ｍｏ层和ＮｉＦｅ层内分别结晶为体心立方和面心立方多晶，层内晶粒尺寸为２—６ｎｍ．（２）在Ｍｏ层厚度为１．６和２．１ｎｍ的多层膜中，ＮｉＦｅ层和Ｍｏ层之间存在两种取向关系：（１１０）Ｍｏ∥（１１１）ＮｉＦｅ，［１１１］Ｍｏ∥［１１０］ＮｉＦｅ和（１１０）Ｍｏ∥（１１１）ＮｉＦｅ，［００１］Ｍｏ∥［１１０］ＮｉＦｅ．（３）ＮｉＦｅ层和Ｍｏ层之间有较清晰的界面．界面附近３—４个原子层范围内，ＮｉＦｅ和Ｍｏ的面间距分别相对块状晶体沿生长方向膨胀和压缩．讨论了界面附近面间距的变化，并根据该多层膜显微结构特征，讨论了此系统未显示巨磁电阻效应的原因．
The results show that: (1) The crystalline state of multilayers varies with the thickness of Mo non-magnetic layer. When the thickness of Mo layer is 07nm, the multi-layer film is almost amorphous. When the thickness of Mo layer is larger than 16nm, the Mo layer and NiFe layer are respectively crystallized as body-centered cubic and face-centered cubic polycrystal, The grain size is 2-6 nm. (2) There are two orientations between NiFe layer and Mo layer in multilayer films with Mo layer thickness of 1.6 and 2.1 nm: (110) Mo // (111) NiFe, [111] Mo // [ 110] NiFe and (110) Mo // (111) NiFe, [001] Mo // [110] NiFe. (3) There is a clearer interface between the NiFe layer and the Mo layer. Within the range of 3-4 atomic layers near the interface, the interplanar spacing of NiFe and Mo expands and compresses relative to the bulk crystals in the growth direction respectively. The change of the distance between the interfaces near the interface was discussed. According to the microstructure characteristics of the multilayer, the reason why the system did not show the effect of giant magnetoresistance was discussed.